About the position
The successful candidate will fabricate nanoscale structures, including optical waveguides and electrodes, for the development of electro-optic devices. Thin films will be formed using techniques such as spin coating and subsequently processed using state-of-the-art fabrication equipment installed at the institute, including etching and sputtering systems, to realize photonic devices such as organic electro-optic modulators.
The candidate will also investigate and evaluate the electrical and optical characteristics of the fabricated devices, assess their performance, and contribute to the advancement and optimization of device fabrication technologies.
Work content and job description
The successful candidate will fabricate nanoscale structures, including optical waveguides and electrodes, for the development of electro-optic devices. Thin films will be formed using techniques such as spin coating and subsequently processed using state-of-the-art fabrication equipment installed at the institute, including etching and sputtering systems, to realize photonic devices such as organic electro-optic modulators.
The candidate will also investigate and evaluate the electrical and optical characteristics of the fabricated devices, assess their performance, and contribute to the advancement and optimization of device fabrication technologies.
Common to all Job Types
Annual Salary :
4 million yen
~
6 million yen
Work experience
Applicants should have basic knowledge of physics and chemistry equivalent to the level of a university graduate. Experience in the following micro- and nanofabrication techniques is desirable:
Fabrication of metal thin films using sputtering or similar techniques
Fabrication of nanoscale structures using electron-beam lithography systems
Nanoscale fabrication using RIE, inductively coupled plasma (ICP) dry etching systems, or similar equipment
Observation and characterization of nanofabricated structures using SEM
Fabrication and evaluation of polymer waveguides
Applicants without prior experience should be able to acquire the necessary skills through approximately one month of on-the-job training (OJT) and subsequently perform the required duties smoothly.
Common to all Job Types
Nontenured
-
Non-tenure track
Job content supplemental explanation
The employment date varies depending on the selection period. Please refer to the "Job posting URL" for the detailed the scheduled date of employment.
Attached documents
Application Form :
Online Submission
,
Mailing
Designated NICT Application Form (photograph required; e-mail address must be clearly indicated)
Application document submission method (physically mailed documents)
184-8795
Tokyo
4-2-1 Nukui-kitamachi, Koganei-shi
Personnel Affairs Group, Personnel Affairs Office, General Affairs Department, National Institute of Information and Communications Technology (NICT)
Notification of result
We inform you of the result of your application in approximately 2 monthes after the documentary screening or the interview is completed.
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information only. Always confirm the details on the original posting before applying.
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